Some Chemical Aspects of the Fluorocarbon Plasma Etching of Silicon and Its Compounds
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Published:1979-01
Issue:1
Volume:23
Page:33-41
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ISSN:0018-8646
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Container-title:IBM Journal of Research and Development
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language:
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Short-container-title:IBM J. Res. & Dev.
Author:
Coburn J. W.,Kay Eric
Subject
General Computer Science
Cited by
151 articles.
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