Fundamental aspects of electron beam lithography. I. Depth‐dose response of polymeric electron beam resists
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.1662892
Reference17 articles.
1. Fundamental aspects of electron beam lithography. II. Low‐voltage exposure of negative resists
2. Device Photolithography: Thin Photosensitive Materials
3. Projection Masking, Thin Photoresist Layers and Interference Effects
4. Determination of Kilovolt Electron Energy Dissipation vs Penetration Distance in Solid Materials
5. Lumineszenz-photometrische Messungen der Energieabsorption im Strahlungsfeld von Elektronenquellen Eindimensionaler Fall in Luft
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