Oxide charge accumulation in metal oxide semiconductor devices during irradiation
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.347603
Reference49 articles.
1. Process technology for radiation-hardened CMOS integrated circuits
2. Radiation Hardening of CMOS Technologies - AN Overview
3. The Effect of Ion Implantation on Oxide Charge Storage in MOS Devices
4. Oxide Charge Trapping Induced by Ion Implantation in SiO2
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