Plasma charge injection technology and its application to c-Si solar cells for field-effect passivation
Author:
Affiliation:
1. Amtech Systems, Inc. 131 S. Clark Drive, Tempe, Arizona 85281, USA
Funder
U.S. Department of Energy
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/am-pdf/10.1063/1.5087725
Reference21 articles.
1. Status and prospects of Al2O3-based surface passivation schemes for silicon solar cells
2. Overview on SiN surface passivation of crystalline silicon solar cells
3. Highest-quality surface passivation of low-resistivity p-type silicon using stoichiometric PECVD silicon nitride
4. 22.8% efficient silicon solar cell
5. Experimental evidence of parasitic shunting in silicon nitride rear surface passivated solar cells
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1. Investigation of long-term light stability of negative charge injected into oxide-nitride-oxide passivation stack of crystalline silicon solar cells;Journal of Applied Physics;2022-12-07
2. Investigation on Light Stability of Injected Charge in α-SiNx: H by Plasma Charge Injection Technology;2021 IEEE 48th Photovoltaic Specialists Conference (PVSC);2021-06-20
3. Full-scale chemical and field-effect passivation: 21.52% efficiency of stable MAPbI3 solar cells via benzenamine modification;Nano Research;2021-01-05
4. Interface Dipole Induced Field‐Effect Passivation for Achieving 21.7% Efficiency and Stable Perovskite Solar Cells;Advanced Functional Materials;2020-10-26
5. Analysis of the negative charges injected into a SiO 2 /SiN x stack using plasma charging technology for field‐effect passivation on a boron‐doped silicon surface;Progress in Photovoltaics: Research and Applications;2020-10-04
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