In situ reaction mechanism studies of plasma-assisted atomic layer deposition of Al2O3
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.2357886
Reference17 articles.
1. Surface chemistry of atomic layer deposition: A case study for the trimethylaluminum/water process
2. Surface Chemistry for Atomic Layer Growth
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4. Low-Temperature Al2O3 Atomic Layer Deposition
5. Al3O3 thin film growth on Si(100) using binary reaction sequence chemistry
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