Dielectric property and thermal stability of HfO2 on silicon
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.1506207
Reference28 articles.
1. High mobility HfO2 n- and p-channel transistors
2. Electrical characteristics of highly reliable ultrathin hafnium oxide gate dielectric
3. Physical and electrical characterization of Hafnium oxide and Hafnium silicate sputtered films
4. Current transport in metal/hafnium oxide/silicon structure
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