Raman scattering microscopy imaging of basal plane stacking faults and associated partial dislocations in 4H-SiC crystals

Author:

Shimada Kana1,Asada Kanta1,Yodo Mikako1,Ohtani Noboru1ORCID

Affiliation:

1. School of Science and Technology, Kwansei Gakuin University, 2-1 Gakuen, Sanda, Hyogo 669-1337, Japan

Publisher

AIP Publishing

Subject

General Physics and Astronomy

Cited by 8 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献

1. Analysis of diamond dislocations by Raman polarization measurement;Diamond and Related Materials;2023-12

2. Development of Raman Spectroscopy for Defect Analysis in SiC Devices;2023 18th International Microsystems, Packaging, Assembly and Circuits Technology Conference (IMPACT);2023-10-25

3. Nucleation of Threading Dislocations in 4H-SiC at Early Physical-Vapor-Transport Growth Stage;Crystal Growth & Design;2023-06-05

4. Insights into the effects of Al-ion implantation temperature on material properties of 4H-SiC;Applied Surface Science;2023-03

5. Raman Spectroscopy Signatures of Boron-Rich Superhard Materials from Density Functional Theory;The Journal of Physical Chemistry C;2023-01-25

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