Author:
Fuse G.,Hirao T.,Inoue K.,Takayanagi S.,Yaegashi Y.
Subject
General Physics and Astronomy
Cited by
26 articles.
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1. Integration Benefits of Carborane Molecular Implant for State-of-the-Art 28-nm Logic pFET Device Manufacturing;IEEE Electron Device Letters;2011-04
2. Point defect engineering in preamorphized silicon enriched with fluorine;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;2006-12
3. Fluorine in preamorphized Si: Point defect engineering and control of dopant diffusion;Journal of Applied Physics;2006-05-15
4. Halogens;Computational Microelectronics;2004
5. Gold-cluster ranges in aluminium, silicon and copper;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;2003-12