First stage of CoSi2 formation during a solid-state reaction
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.4904852
Reference24 articles.
1. Towards implementation of a nickel silicide process for CMOS technologies
2. Formation of thin films of CoSi2: Nucleation and diffusion mechanisms
3. A self-aligned cobalt silicide technology using rapid thermal processing
4. Influence of processing conditions on CoSi2 formation in the presence of a Ti capping layer
5. Texture of CoSi2 films on Si(111), (110) and (001) substrates
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