Texture of CoSi2 films on Si(111), (110) and (001) substrates-Reference-Cited by-同舟云学术

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Texture of CoSi2 films on Si(111), (110) and (001) substrates

Published:2010-12 Issue:4 Volume:519 Page:1277-1284
ISSN:0040-6090
Container-title:Thin Solid Films
language:en
Short-container-title:Thin Solid Films

Author:

De Keyser K.,Detavernier C.,Jordan-Sweet J.,Lavoie C.

Publisher

Elsevier BV

Subject

Materials Chemistry,Metals and Alloys,Surfaces, Coatings and Films,Surfaces and Interfaces,Electronic, Optical and Magnetic Materials

Reference27 articles.

1. Metal Silicides in CMOS Technology: Past, Present, and Future Trends

2. Thermal expansion behavior of NiSi/NiSi2

3. Thermal expansion of the isostructural PtSi and NiSi: Negative expansion coefficient in NiSi and stress effects in thin films

4. Ceramic Transactions;De Keyser;Volume,2008

5. K. De Keyser, B. De Schutter C. Detavernier, V. Machkaoutsan, M. Bauer, S.G. Thomas, J. Jordan Sweet, C. Lavoie, Microelectron. Eng. doi:10.1016/j.mee.2010.06.010, in press.

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3. Correlated TKD/EDS - TEM - APT analysis on selected interfaces of CoSi2 thin films;Ultramicroscopy;2019-11

4. Axiotaxy in oxide heterostructures: Preferential orientation of BaCeO3 nanoparticles embedded in superconducting YBa2Cu3O7− thin films;Thin Solid Films;2017-09

5. Axiotaxy of Bismuth Telluride Films on InP(111)B by High-Temperature Hot Wall Epitaxy;Crystal Growth & Design;2017-03-01

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