Effect of a Ti diffusion barrier on the cobalt silicide formation: solid solution, segregation and reactive diffusion
Author:
Publisher
Elsevier BV
Subject
Metals and Alloys,Polymers and Plastics,Ceramics and Composites,Electronic, Optical and Magnetic Materials
Reference48 articles.
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3. Formation and characterization of transition-metal silicides;Nicolet;VLSI Electronics Microstructure Science,1983
4. Kinetics of formation of silicides: A review;D’Heurle;Journal of Materials Research,1986
5. Analysis of kinetics of reactive diffusion in a hypothetical binary system;Kajihara;Acta Materialia,2004
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