An ultra-low energy (30–200 eV) ion-atomic beam source for ion-beam-assisted deposition in ultrahigh vacuum
Author:
Publisher
AIP Publishing
Subject
Instrumentation
Link
http://aip.scitation.org/doi/pdf/10.1063/1.3622749
Reference12 articles.
1. Modification of thin film properties by ion bombardment during deposition
2. Ion beam assisted deposition—a processing technique for preparing thin films for high-technology applications
3. Early stages of IBAD-film growth: Differences between (100) and polycrystalline Mo substrates
4. Texture of IBAD TiN films as a function of ion-beam intensity and angular incidence
5. The low energy ion assisted control of interfacial structure: ion incident angle effects
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