Comparisons between a gas‐phase model of silane chemical vapor deposition and laser‐diagnostic measurements
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.336909
Reference44 articles.
1. A Mathematical Model of the Coupled Fluid Mechanics and Chemical Kinetics in a Chemical Vapor Deposition Reactor
2. Pulsed UV laser Raman spectroscopy of silane in a linear‐flow chemical vapor deposition reactor
3. Observation of HSiCl in a chemical vapor deposition reactor by laser‐excited fluorescence
4. Observation of Si2in a chemical vapor deposition reactor by laser excited fluorescence
5. A Stagnant Layer Model for the Epitaxial Growth of Silicon from Silane in a Horizontal Reactor
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