Observation of HSiCl in a chemical vapor deposition reactor by laser‐excited fluorescence
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.94141
Reference15 articles.
1. Rate-determining reactions and surface species in CVD silicon
2. High Temperature Reactions in the Silicon-Hydrogen-Chlorine System
3. The Equilibrium Behavior of the Silicon-Hydrogen-Chlorine System
4. Control of the VPE layer properties by the characteristics of the boundary layer
5. Experimental Investigation of the Gas Phase in a Chemical Vapor Deposition Reaction: Application to the Silane‐Ammonia Reaction Leading to Silicon Nitride Deposits
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