Electronegativity-dependent tin etching from thin films
Author:
Affiliation:
1. Industrial Focus Group XUV Optics, MESA+ Institute for Nanotechnology, University of Twente, Drienerlolaan 5, Enschede, the Netherlands
Funder
Focus Group IFG-XUV
Nanonext 9B NNXT 9B04
SP3E 123
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.4960429
Reference18 articles.
1. Plasma sources for EUV lithography exposure tools
2. Progress in EUV optics lifetime expectations
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4. Decomposition of SnH4 molecules on metal and metal–oxide surfaces
5. Sn etching with hydrogen radicals to clean EUV optics
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