Electronegativity-dependent tin etching from thin films
Author:
Affiliation:
1. Industrial Focus Group XUV Optics, MESA+ Institute for Nanotechnology, University of Twente, Drienerlolaan 5, Enschede, the Netherlands
Funder
Focus Group IFG-XUV
Nanonext 9B NNXT 9B04
SP3E 123
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.4960429
Reference18 articles.
1. Plasma sources for EUV lithography exposure tools
2. Progress in EUV optics lifetime expectations
3. Atomic-hydrogen cleaning of Sn from Mo/Si and DLC/Si extreme ultraviolet multilayer mirrors
4. Decomposition of SnH4 molecules on metal and metal–oxide surfaces
5. Sn etching with hydrogen radicals to clean EUV optics
Cited by 15 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Room temperature chemical transformation of SnSe to Ag2Se nanocrystals via cation exchange;Materials Advances;2024
2. Insight into the Re-Deposition Equilibrium of Sn Contaminant on Euv Multi-Layer Mirror Surface During Hydrogen Plasma Cleaning;2024
3. Promotion of Plasma-Induced Deuterium Uptake in Ruthenium Films by Monolayer-Thick Tin Layers;ACS Applied Materials & Interfaces;2023-11-22
4. Promoting the performance of Nb2O5 by doping transition metal oxide for catalytic degradation of monochlorobenzene and toluene;Journal of Materials Research and Technology;2023-07
5. Low‐temperature reduction of SnO 2 by floating wire‐assisted medium‐pressure H 2 /Ar plasma;Plasma Processes and Polymers;2022-02-21
1.学者识别学者识别
2.学术分析学术分析
3.人才评估人才评估
"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370
www.globalauthorid.com
TOP
Copyright © 2019-2024 北京同舟云网络信息技术有限公司 京公网安备11010802033243号 京ICP备18003416号-3