Ion and chemical radical effects on the step coverage of plasma enhanced chemical vapor deposition tetraethylorthosilicate films
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.345546
Reference17 articles.
1. The Deposition of Silicon Dioxide Films at Reduced Pressure
2. Low Pressure Deposition of Phosphosilicate Glass Films
3. Evaluation of the Phosphorus Concentration and Its Effect on Viscous Flow and Reflow in Phosphosilicate Glass
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