Low-energy Ar+ ion-beam-induced chemical vapor deposition of silicon dioxide films using tetraethyl orthosilicate-Reference-Cited by-同舟云学术

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Low-energy Ar+ ion-beam-induced chemical vapor deposition of silicon dioxide films using tetraethyl orthosilicate

Published:2023-04 Issue:4 Volume:9 Page:e14643
ISSN:2405-8440
Container-title:Heliyon
language:en
Short-container-title:Heliyon

Author:

Yoshimura Satoru^ORCID,Sugimoto Satoshi,Takeuchi Takae,Kiuchi Masato

Publisher

Elsevier BV

Subject

Multidisciplinary

Reference38 articles.

1. Plasma-enhanced chemical vapor deposition of silicon dioxide deposited at low temperatures;Ceiler;J. Electrochem. Soc.,1995

2. Three-dimensional nanostructure fabrication by focused-ion-beam chemical vapor deposition;Matsui;J. Vac. Sci. Technol., B,2000

3. Focused-ion-beam deposition for 3-D nanostructure fabrication;Matsui;Nucl. Instrum. Methods Phys. Res. B,2007

4. Miniaturization process of three-dimensional nanostructures fabricated by focused-ion-beam chemical vapor deposition;Kometani;Jpn. J. Appl. Phys.,2021

5. Ion beam induced chemical vapor deposition with hexamethyldisilane for hydrogenated amorphous silicon carbide and silicon carbonitride films;Matsutani;Surf. Coat. Technol.,2003

Cited by 4 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Low-energy N+ ion beam induced chemical vapor deposition using tetraethyl orthosilicate, hexamethyldisiloxane, or hexamethyldigermane;AIP Advances;2024-09-01

2. Autocatalytic Deposition of Nickel–Boron Diffusion Barrier onto Diazonium-Treated SiO₂ for High Aspect Ratio Through-Silicon Via Technology in 3D Integration;ACS Applied Electronic Materials;2024-03-14

3. Silicon oxide film formation by spraying tetraethyl orthosilicate onto substrate with simultaneous low-energy SiO+ ion-beam irradiation;AIP Advances;2023-11-01

4. Deposition of germanium dioxide films by the injection of oxygen ion beam in conjunction with hexamethyldigermane;Nuclear Instruments and Methods in Physics Research Section A: Accelerators, Spectrometers, Detectors and Associated Equipment;2023-11

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