A unified static-dynamic analytic model for ultra-scaled III-nitride high electron mobility transistors

Author:

Li Kexin1ORCID,Rakheja Shaloo1ORCID

Affiliation:

1. Department of Electrical and Computer Engineering, New York University, Brooklyn, New York 11201, USA

Funder

Boeing

Publisher

AIP Publishing

Subject

General Physics and Astronomy

Cited by 5 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献

1. Wideband Switched-Capacitor and Switched-Transmission-line Circulators in 40nm GaN Technology: Design and Device Modeling;2023 IEEE BiCMOS and Compound Semiconductor Integrated Circuits and Technology Symposium (BCICTS);2023-10-16

2. Emerging GaN technologies for power, RF, digital, and quantum computing applications: Recent advances and prospects;Journal of Applied Physics;2021-10-28

3. Soft-HaT;ACM Transactions on Design Automation of Electronic Systems;2020-09-02

4. A Physics-Based Compact Model for Ultrathin Black Phosphorus FETs—Part I: Effect of Contacts, Temperature, Ambipolarity, and Traps;IEEE Transactions on Electron Devices;2020-01

5. Modeling and Simulation of Quasi-Ballistic III-Nitride Transistors for RF and Digital Applications;International Journal of High Speed Electronics and Systems;2019-03

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