Efficient 13.5nm extreme ultraviolet emission from Sn plasma irradiated by a long CO2 laser pulse
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.2951595
Reference14 articles.
1. Extreme ultraviolet lithography: overview and development status
2. Comparative study on emission characteristics of extreme ultraviolet radiation from CO2 and Nd:YAG laser-produced tin plasmas
3. LPP EUV source development for HVM
4. CO 2 laser-produced Sn plasma as the solution for high-volume manufacturing EUV lithography
5. Optimizing 13.5nm laser-produced tin plasma emission as a function of laser wavelength
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