Nanoscale patterns produced by self-sputtering of solid surfaces: The effect of ion implantation
Author:
Affiliation:
1. Department of Physics, Colorado State University, Fort Collins, Colorado 80523, USA
2. II. Physikalisches Institut, Universität Göttingen, Friedrich-Hund-Platz 1, 37077 Göttingen, Germany
Funder
Division of Materials Research (DMR)
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/am-pdf/10.1063/1.4960807
Reference41 articles.
1. Self-organized nanopatterning of silicon surfaces by ion beam sputtering
2. Formation of Ordered Nanoscale Semiconductor Dots by Ion Sputtering
3. Roughness Evolution of Ion Sputtered Rotating InP Surfaces: Pattern Formation and Scaling Laws
4. Self-Assembly of Ordered Semiconductor Nanoholes by Ion Beam Sputtering
5. Spontaneous Pattern Formation Induced by Ion Bombardment of Binary Compounds
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