Plasma parameters in very high frequency helium and argon plasmas at atmospheric pressure
Author:
Affiliation:
1. Department of Precision Engineering, Graduate School of Engineering, Osaka University, 2-1 Yamada-oka, Suita, Osaka 565–0871, Japan
Funder
Japan Society for the Promotion of Science
JST, CREST
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/5.0010195
Reference50 articles.
1. Status and potential of atmospheric plasma processing of materials
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3. Atmospheric plasmas for thin film deposition: A critical review
4. Atmospheric Pressure Low Temperature Direct Plasma Technology: Status and Challenges for Thin Film Deposition
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