Plasma parameters in very high frequency argon plasmas mixed with nitrogen at atmospheric pressure-Reference-Cited by-同舟云学术

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Plasma parameters in very high frequency argon plasmas mixed with nitrogen at atmospheric pressure

Published:2021-05-07 Issue:17 Volume:129 Page:173302
ISSN:0021-8979
Container-title:Journal of Applied Physics
language:en
Short-container-title:Journal of Applied Physics

Author:

Yasutake Kiyoshi¹,Yoshida Kazushi¹,Ohmi Hiromasa¹^ORCID,Kakiuchi Hiroaki¹^ORCID

Affiliation:

1. Department of Precision Engineering, Graduate School of Engineering, Osaka University, 2-1 Yamada-oka, Suita, Osaka 565-0871, Japan

Funder

Ministry of Education, Culture, Sports, Science and Technology

Publisher

AIP Publishing

Subject

General Physics and Astronomy

Link

https://aip.scitation.org/doi/pdf/10.1063/5.0047057

Reference39 articles.

1. Status and potential of atmospheric plasma processing of materials

2. Nonequilibrium Atmospheric Plasma Deposition

3. Atmospheric plasmas for thin film deposition: A critical review

4. Atmospheric Pressure Low Temperature Direct Plasma Technology: Status and Challenges for Thin Film Deposition

Cited by 1 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Formation of indium nitride nanostructures by atmospheric pressure plasma nitridation of molten indium;Journal of Applied Physics;2021-08-14

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