Electrical properties of contact etchedp‐Si: A comparison between magnetically enhanced and conventional reactive ion etching
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.357647
Reference50 articles.
1. An Overview of Dry Etching Damage and Contamination Effects
2. Observation of boron acceptor neutralization in silicon produced by CF4reactive ion etching or Ar ion beam etching
3. Electrical studies on plasma and reactive‐ion‐etched silicon
Cited by 21 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Characterization techniques of ion bombardment damage on electronic devices during plasma processing—plasma process-induced damage;Japanese Journal of Applied Physics;2021-03-23
2. Recombination-free reactive ion etch for high efficiency silicon solar cells;Solar Energy Materials and Solar Cells;2017-12
3. Modeling of defect generation during plasma etching and its impact on electronic device performance—plasma-induced damage;Journal of Physics D: Applied Physics;2017-07-20
4. Electrical characterization of carrier trapping behavior of defects created by plasma exposures;Journal of Physics D: Applied Physics;2017-06-07
5. Defect generation in electronic devices under plasma exposure: Plasma-induced damage;Japanese Journal of Applied Physics;2017-05-25
1.学者识别学者识别
2.学术分析学术分析
3.人才评估人才评估
"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370
www.globalauthorid.com
TOP
Copyright © 2019-2024 北京同舟云网络信息技术有限公司 京公网安备11010802033243号 京ICP备18003416号-3