Manipulation of nucleation sites in solid‐state Si crystallization
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.105633
Reference12 articles.
1. Low-temperature process to increase the grain size in polysilicon films
2. Effects of Silicon Implantation and Processing Temperature on Performance of Polycrystalline Silicon Thin-Film Transistors Fabricated from Low Pressure Chemical Vapor Deposited Amorphous Silicon
3. Polysilicon Super Thin Film Transistor Technology
4. Crystal forms by solid‐state recrystallization of amorphous Si films on SiO2
5. Manipulation of nucleation sites and periods over amorphous substrates
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