The impact of the density and type of reactive sites on the characteristics of the atomic layer deposited WNxCy films-Reference-Cited by-同舟云学术

The impact of the density and type of reactive sites on the characteristics of the atomic layer deposited WNxCy films

Published:2006-03-15 Issue:6 Volume:99 Page:063515
ISSN:0021-8979
Container-title:Journal of Applied Physics
language:en
Short-container-title:Journal of Applied Physics

Author:

Martin Hoyas A.,Travaly Y.,Schuhmacher J.,Sajavaara T.,Whelan C. M.,Eyckens B.,Richard O.,Giangrandi S.,Brijs B.,Vandervorst W.,Maex K.,Celis J. P.,Jonas A. M.,Vantomme A.

Publisher

AIP Publishing

Subject

General Physics and Astronomy

Link

http://aip.scitation.org/doi/pdf/10.1063/1.2182074

Reference33 articles.

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2. M. Ritala and M. Leskelä, in Handbook of Thin Film Materials, edited by H. S. Nalva (Academic, New York, 2002), Vol. 1, p. 135.

3. Analysis of hydroxyl group controlled atomic layer deposition of hafnium dioxide from hafnium tetrachloride and water

4. Island growth as a growth mode in atomic layer deposition: A phenomenological model

5. Initial growth mechanism of atomic layer deposited TiN

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