Island growth as a growth mode in atomic layer deposition: A phenomenological model-Reference-Cited by-同舟云学术

Island growth as a growth mode in atomic layer deposition: A phenomenological model

Published:2004-12-15 Issue:12 Volume:96 Page:7686-7695
ISSN:0021-8979
Container-title:Journal of Applied Physics
language:en
Short-container-title:Journal of Applied Physics

Author:

Puurunen Riikka L.,Vandervorst Wilfried

Publisher

AIP Publishing

Subject

General Physics and Astronomy

Link

http://aip.scitation.org/doi/pdf/10.1063/1.1810193

Reference64 articles.

1. M. Ritala and M. Leskelä, inHandbook of Thin Film Materials, edited by H. S. Nalwa (Academic, San Diego, 2002), Vol. 1, pp. 103–159.

2. Atomic Layer Deposition Chemistry: Recent Developments and Future Challenges

3. A. M. Shevjakov, G. N. Kuznetsova, and V. B. Aleskovskii, in Chemistry of high-temperature materials, Proceedings of 2nd USSR conference on high-temperature chemistry of oxides, Leningrad, USSR, 26–29 November 1965 (Nauka, Leningrad, 1967), pp. 149–155.

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