The influence of the annealing sequence on p+/n junctions observed by scanning capacitance microscopy
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.1762692
Reference22 articles.
1. Lateral dopant profiling in semiconductors by force microscopy using capacitive detection
2. Scanning capacitance microscopy measurement of two-dimensional dopant profiles across junctions
3. Scanning capacitance microscope methodology for quantitative analysis of p-n junctions
4. Electrical simulation of scanning capacitance microscopy imaging of the pn junction with semiconductor probe tips
5. Observation of metal–oxide–semiconductor transistor operation using scanning capacitance microscopy
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