On the surface condition of Langmuir probes in reactive plasmas
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.1338489
Reference11 articles.
1. Electron energy distributions in plasmas IV. Oxygen and nitrogen
2. Equilibrium density of h- in a low pressure hydrogen plasma
3. Negative ion measurements and etching in a pulsed-power inductively coupled plasma in chlorine
4. Temporal behavior of the electron and negative ion densities in a pulsed radio‐frequency CF4 plasma
5. Production of a quasi electron free plasma using electronic attachment
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