Langmuir probe and optical emission spectroscopy studies in magnetron sputtering plasmas for Al-doped ZnO film deposition-Reference-Cited by-同舟云学术

Langmuir probe and optical emission spectroscopy studies in magnetron sputtering plasmas for Al-doped ZnO film deposition

Published:2015-01-14 Issue:2 Volume:117 Page:023301
ISSN:0021-8979
Container-title:Journal of Applied Physics
language:en
Short-container-title:Journal of Applied Physics

Author:

Sahu B. B.¹,Han Jeon G.¹,Hori Masaru²,Takeda Keigo²

Affiliation:

1. NU-SKKU Joint Institute Plasma-Nano Materials (IPNM), Center for Advance Plasma Surface Technology (CAPST), School of Materials Science and Engineering, Sungkyunkwan University, Suwon, South Korea

2. Plama Nanotechnology Research Center, Nagoya University, Nagoya, Japan

Funder

Korea Institute for Advancement of Technology (KIAT)

Ministry of Science, ICT and Future Planning (MSIP)

Publisher

AIP Publishing

Subject

General Physics and Astronomy

Link

http://aip.scitation.org/doi/pdf/10.1063/1.4905541

Reference68 articles.

1. Synthesis and characterization of dye-sensitized solar cell using photoanode of TiO2 nanoparticles/Ti-mesh electrode

2. Recent progress in thin film processing by magnetron sputtering with plasma diagnostics

3. Effects of SiO2 interlayer on electrical properties of Al-doped ZnO films under bending stress

4. Plasma Diagnostics and Characterizations of Al-Doped ZnO Films Deposited with Low Temperature Sputtering Process

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