n-type GaN surface etched green light-emitting diode to reduce non-radiative recombination centers
Author:
Affiliation:
1. Faculty of Science and Technology, Meijo University, Nagoya 468-8502, Japan
2. Akasaki Research Center, Nagoya University, Nagoya 464-8603, Japan
Funder
Japan Society for the Promotion of Science
Core Research for Evolutional Science and Technology
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/5.0035343
Reference40 articles.
1. Effects of ain buffer layer on crystallographic structure and on electrical and optical properties of GaN and Ga1−xAlxN (0 < x ≦ 0.4) films grown on sapphire substrate by MOVPE
2. P-Type Conduction in Mg-Doped GaN Treated with Low-Energy Electron Beam Irradiation (LEEBI)
3. GaN Growth Using GaN Buffer Layer
4. Breakthroughs in Improving Crystal Quality of GaN and Invention of the p–n Junction Blue-Light-Emitting Diode
5. Solid-State Light Sources Getting Smart
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