Structural properties of reactively sputtered W–Si–N thin films-Reference-Cited by-同舟云学术

Structural properties of reactively sputtered W–Si–N thin films

Published:2007-08 Issue:3 Volume:102 Page:033505
ISSN:0021-8979
Container-title:Journal of Applied Physics
language:en
Short-container-title:Journal of Applied Physics

Author:

Vomiero A.,Boscolo Marchi E.,Quaranta A.,Della Mea G.,Brusa R. S.,Mariotto G.,Felisari L.,Frabboni S.,Tonini R.,Ottaviani G.,Mattei G.,Scandurra A.,Puglisi O.

Publisher

AIP Publishing

Subject

General Physics and Astronomy

Link

http://aip.scitation.org/doi/pdf/10.1063/1.2761828

Reference40 articles.

1. Method for fabricating a low stress x-ray mask using annealable amorphous refractory compounds

2. Superhard nanocrystalline composite materials: The TiN/Si3N4 system

3. Novel thermodynamically stable and oxidation resistant superhard coating materials

4. Hardness versus structure in W–Si–N sputtered coatings

5. How is the chemical bonding of W–Si–N sputtered coatings?

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