Interfacial properties of InP and phosphorus deposited at low temperature
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.96188
Reference17 articles.
1. Metal‐insulator‐semiconductor diodes fabricated on InP, InGaAsP, and InGaAs
2. Inversion layers on InP
3. Electrical properties of the gallium arsenide–insulator interface
4. Investigation of heterojunctions for MIS devices with oxygen‐doped AlxGa1−xAs onn‐type GaAs
5. Chemical vapor deposition and characterization of phosphorus nitride (P3N5) gate insulators for InP metal‐insulator‐semiconductor devices
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1. Atomic layer deposition of metal phosphates;Applied Physics Reviews;2022-03
2. Effective Surface Passivation of InP Nanowires by Atomic-Layer-Deposited Al2O3 with POx Interlayer;Nano Letters;2017-09-11
3. Surface state density distribution at vacuum-annealed InP(100) surface as derived from the rigorous analysis of photoluminescence efficiency;Applied Surface Science;2008-10
4. AES and EELS analysis of the interaction between phosphorus and metallic indium;Journal of Electron Spectroscopy and Related Phenomena;1994-05
5. Measurement of Surface Fermi Level in Phosphidized GaAs;Japanese Journal of Applied Physics;1992-11-01
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