Microstructural characterization of solid-phase crystallized amorphous silicon films recrystallized using an excimer laser
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.118254
Reference11 articles.
1. Excimer-laser-annealed poly-Si thin-film transistors
2. Grain growth in laser dehydrogenated and crystallized polycrystalline silicon for thin film transistors
3. High-performance thin-film transistors in low-temperature crystallized LPCVD amorphous silicon films
4. Low temperature polysilicon TFTs: a comparison of solid phase and laser crystallization
5. Phase transformation mechanisms involved in excimer laser crystallization of amorphous silicon films
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