The segmented non-uniform dielectric module design for uniformity control of plasma profile in a capacitively coupled plasma chamber
Author:
Affiliation:
1. Department of Mechanical Engineering, Tsinghua University, Beijing 100084, China
Funder
National science and technology major project of the MOST, China
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://scitation.aip.org/deliver/fulltext/aip/journal/adva/4/12/1.4904216.pdf?itemId=/content/aip/journal/adva/4/12/10.1063/1.4904216&mimeType=pdf&containerItemId=content/aip/journal/adva
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Cited by 2 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Numerical optimization of dielectric properties to achieve process uniformity in capacitively coupled plasma reactors;Plasma Sources Science and Technology;2024-01-01
2. New simulation-based approach for the profile control in a process chamber: Fluid, thermal, and plasma profile;Proceedings of the Institution of Mechanical Engineers, Part E: Journal of Process Mechanical Engineering;2015-11-04
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