Effect of thickness of metal electrode on the performance of SiNx-based resistive switching devices
Author:
Affiliation:
1. Wide Bandgap Semiconductor Technology Disciplines State Key Laboratory, School of Microelectronics, Xidian University, Xi'an 710071, China
2. School of Advanced Materials and Nanotechnology, Xidian University, Xi'an 710071, China
Funder
Union Foundation of Ministry of Education of China
National Natural Science Foundation of China
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.5062597
Reference29 articles.
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2. Demonstration of Synaptic Behaviors and Resistive Switching Characterizations by Proton Exchange Reactions in Silicon Oxide
3. Voltage-Polarity-Independent and High-Speed Resistive Switching Properties of V-Doped $\hbox{SrZrO}_{3}$ Thin Films
4. Improved reliability of Au/Si3N4/Ti resistive switching memory cells due to a hydrogen postannealing treatment
5. Forming-free SiN-based resistive switching memory prepared by RF sputtering
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