Formation of iridium silicides from Ir thin films on Si substrates
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.326325
Reference18 articles.
1. A New MOS Process Using MoSi2as a Gate Material
2. Oxidation mechanisms in WSi2thin films
3. Beam-Lead Technology
4. Metallurgical properties and electrical characteristics of palladium silicide-silicon contacts
5. Kinetics and mechanism of platinum silicide formation on silicon
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2. Nano-scale NiSi and n-type silicon based Schottky barrier diode as a near infra-red detector for room temperature operation;Journal of Applied Physics;2014-09-28
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