Experimental evidence of transition between dynamical and kinematical diffraction regimes in ion-implanted Si observed through X-ray multiple-beam diffraction mappings
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.4963791
Reference23 articles.
1. X-Ray Multiple-Wave Diffraction
2. Realizing in-plane surface diffraction by x-ray multiple-beam diffraction with large incidence angle
3. Hybrid multiple diffraction in Renninger scan for heteroepitaxial layers
4. Analysis of interfacial misfit dislocation by X-ray multiple diffraction
5. Sensitivity of Bragg surface diffraction to analyze ion-implanted semiconductors
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1. Xenon Nanobubbles and Residual Defects in Annealed Xe‐Implanted Si(001): Analysis by the Combination of Advanced Synchrotron X‐Ray Diffraction and Transmission Electron Microscopy Techniques;Advanced Materials Technologies;2024-04-18
2. Assessment of phase transition and thermal expansion coefficients by means of secondary multiple reflections of Renninger scans;Journal of Applied Crystallography;2019-10-17
3. The magnetic properties of CoFeB and CoFeB/Ag nanodot arrays fabricated by a template transfer imprinting method;Thin Solid Films;2018-08
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