Cluster-eliminating filter for depositing cluster-free a-Si:H films by plasma chemical vapor deposition
Author:
Publisher
AIP Publishing
Subject
Instrumentation
Link
http://aip.scitation.org/doi/pdf/10.1063/1.2126572
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1. Reversible conductivity changes in discharge‐produced amorphous Si
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2. Effect of hydrogen dilution on the silicon cluster volume fraction of a hydrogenated amorphous silicon film prepared using plasma-enhanced chemical vapor deposition;Current Applied Physics;2020-01
3. Effect of Higher-Order Silane Deposition on Spatial Profile of Si-H2/Si-H Bond Density Ratio of a-Si:H Films;Plasma and Fusion Research;2019-09-09
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5. Effects of gas flow rate on deposition rate and number of Si clusters incorporated into a-Si:H films;Japanese Journal of Applied Physics;2015-12-15
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