Defect densities and hydrogen diffusion in hydrogenated amorphous Si‐based alloys
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.105696
Reference22 articles.
1. Defects in hydrogenated amorphous silicon‐carbon alloy films prepared by glow discharge decomposition and sputtering
2. Local atomic structure in thin films of silicon nitride and silicon diimide produced by remote plasma-enhanced chemical-vapor deposition
3. Preparation of highly photosensitive hydrogenated amorphous Si‐C alloys from a glow‐discharge plasma
4. Electronic and optical properties of a-Si1-xCx films prepared from a H2-diluted mixture of SiH4 and CH4
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2. Investigation of hydrogen plasma treatment for reducing defects in silicon quantum dot superlattice structure with amorphous silicon carbide matrix;Nanoscale Research Letters;2014-02-12
3. Optoelectronic properties of a-Si1-xCx:H films grown in hydrogen diluted silane-methane plasma;physica status solidi (c);2010-02-04
4. Trap-limited diffusion of hydrogen in precursor derived amorphous Si–B–C–N-ceramics;Journal of Non-Crystalline Solids;2007-11
5. Comparative study of trap-limited hydrogen diffusion in amorphous SiC, Si0.66C0.33N1.33, and SiN1.33films;Journal of Physics: Condensed Matter;2006-05-26
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