Preparation of highly photosensitive hydrogenated amorphous Si‐C alloys from a glow‐discharge plasma
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.337528
Reference9 articles.
1. Electrical and optical properties of amorphous silicon carbide, silicon nitride and germanium carbide prepared by the glow discharge technique
2. Compositional and structural properties of amorphous SixC1−x : H alloys prepared by reactive sputtering
3. Optical absorption, photoconductivity, and photoluminescence of glow-discharge amorphousSi1−xGexalloys
4. Preferential Attachment of H in Amorphous Hydrogenated Binary Semiconductors and Consequent Inferior Reduction of Pseudogap State Density
5. ESR and IR Studies on a-Si1-xGex:H Prepared by Glow Discharge Decomposition
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