Growth of particles in cluster-size range in low pressure and low power SiH4 rf discharges
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.371256
Reference18 articles.
1. Nanoparticle deposition in hydrogenated amorphous silicon films during rf plasma deposition
2. Particle accumulation in a flowing silane discharge
3. Development of Photon-Counting Laser-Light-Scattering Method for Detection of Nano-Particles Formed in CVD Plasmas.
4. Novelin situmethod to detect subnanometer‐sized particles in plasmas and its application to particles in helium‐diluted silane radio frequency plasmas
5. Detection of particles in rf silane plasmas using photoemission method
Cited by 34 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Metastable States of Dusty Plasma. Comparison with the Experiment;Technical Physics;2021-09
2. Size and flux of carbon nanoparticles synthesized by Ar+CH4 multi-hollow plasma chemical vapor deposition;Diamond and Related Materials;2020-11
3. Effect of hydrogen dilution on the silicon cluster volume fraction of a hydrogenated amorphous silicon film prepared using plasma-enhanced chemical vapor deposition;Current Applied Physics;2020-01
4. Spatial-Structure of Fluctuation of Amount of Nanoparticles in Amplitude-Modulated VHF Discharge Reactive Plasma;Plasma and Fusion Research;2019-09-09
5. Initial growth kinetics of positive and negative hydrogenated Si cluster ions under the presence of silane radicals;Japanese Journal of Applied Physics;2019-03-19
1.学者识别学者识别
2.学术分析学术分析
3.人才评估人才评估
"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370
www.globalauthorid.com
TOP
Copyright © 2019-2024 北京同舟云网络信息技术有限公司 京公网安备11010802033243号 京ICP备18003416号-3