Spatial-Structure of Fluctuation of Amount of Nanoparticles in Amplitude-Modulated VHF Discharge Reactive Plasma-Reference-Cited by-同舟云学术

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Spatial-Structure of Fluctuation of Amount of Nanoparticles in Amplitude-Modulated VHF Discharge Reactive Plasma

Published:2019-09-09 Issue:0 Volume:14 Page:4406120-4406120
ISSN:1880-6821
Container-title:Plasma and Fusion Research
language:en
Short-container-title:Plasma and Fusion Research

Author:

ZHOU Ren¹,KAMATAKI Kunihiro¹,OHTOMO Hiroshi¹,YAMASHITA Daisuke¹,ITAGAKI Naho¹,KOGA Kazunori¹,SHIRATANI Masaharu¹

Affiliation:

1. Department of Electronics, Kyushu University

Publisher

Japan Society of Plasma Science and Nuclear Fusion Research

Subject

Condensed Matter Physics

Link

https://www.jstage.jst.go.jp/article/pfr/14/0/14_4406120/_pdf

Reference37 articles.

1. [1] ITRS 2.0, www.itrs2.net

2. [2] K. Ono, H. Ohta and K. Eriguchi, Thin Solid Films 518, 3461 (2010).

3. [3] W. Huang, M.R. Stan, S. Gurumurthi, R.J. Ribando and K. Skadron, 26th IEEE SEMI-THERM Symposium 198 (2010).

4. [4] K. Maex, M.R. Baklanov, D. Shamiryan, F. lacopi, S.H. Brongersma and Z.S. Yanovistskaya, J. Appl. Phys. 93, 8793 (2003).

5. [5] K.J. Kanarik, T. Lill, E.A. Hudson, S. Sriraman, S. Tan, J. Marks, V. Vahedi and R.A. Gottscho, J. Vac. Sci. Technol. 33, 020802 (2015).

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1. Ion Trajectory Control in Processing Plasmas for Nano-Fabrication;Key Engineering Materials;2023-12-05

2. Effects of amplitude modulated discharge on growth of nanoparticles in TEOS/O₂/Ar capacitively coupled plasma;AIP Advances;2022-08-01

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