Effect of helium incorporation on plasma parameters and characteristic properties of hydrogen free carbon films deposited using DC magnetron sputtering-Reference-Cited by-同舟云学术

Effect of helium incorporation on plasma parameters and characteristic properties of hydrogen free carbon films deposited using DC magnetron sputtering

Published:2020-01-07 Issue:1 Volume:127 Page:014901
ISSN:0021-8979
Container-title:Journal of Applied Physics
language:en
Short-container-title:Journal of Applied Physics

Author:

Sahu Bibhuti B.¹^ORCID,Kim Sung I.¹,Lee Min W.¹,Han Jeon G.²

Affiliation:

1. School of Advanced Materials Science and Engineering, Center for Advanced Plasma Surface Technology (CAPST), Sungkyunkwan University, Suwon 440-746, South Korea

2. Department of Industrial Engineering, Faculty of Engineering, Chiang Mai University, Chiang Mai 50200, Thailand

Funder

National Research Foundation of Korea

Publisher

AIP Publishing

Subject

General Physics and Astronomy

Link

http://aip.scitation.org/doi/pdf/10.1063/1.5115449

Reference48 articles.

1. A review of automotive proton exchange membrane fuel cell degradation under start-stop operating condition

2. Magnetron Sputtering Deposition of Conductive Diamond-Like Carbon Films with Embedded Nanoparticles