Influence of helium incorporation on growth process and properties of aluminum thin films deposited by DC magnetron sputtering-Reference-Cited by-同舟云学术

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Influence of helium incorporation on growth process and properties of aluminum thin films deposited by DC magnetron sputtering

Published:2021-11 Issue: Volume:426 Page:127808
ISSN:0257-8972
Container-title:Surface and Coatings Technology
language:en
Short-container-title:Surface and Coatings Technology

Author:

Ibrahim Sara,Lahboub Fatima Zahrae,Brault Pascal,Petit Agnès,Caillard Amaël,Millon Eric,Sauvage Thierry,Fernández Asunción,Thomann Anne-Lise

Publisher

Elsevier BV

Subject

Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,General Chemistry

Reference49 articles.

1. Introduction of helium into metals by magnetron sputtering deposition method;Zheng;Mater. Lett.,2005

2. Helium-charged titanium films deposited by direct current magnetron sputtering;Shi;Thin Solid Films.,2005

3. DIADDHEM set-up: new IBA facility for studying the helium behavior in nuclear glasses;Chamssedine;Nucl. Instrum. Methods Phys. Res. Sect. B Beam Interact. Mater. At.,2010

4. Low Energy and low fluence helium implantations in tungsten: molecular dynamics simulations and experiments;Pentecoste;J. Nucl. Mater.,2016

5. Substrate temperature and ion kinetic energy effects on first steps of He+ implantation in tungsten: experiments and simulations;Pentecoste;Acta Mater.,2017

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1. DC magnetron sputter deposition in pure helium gas: formation of porous films or gas/solid nanocomposite coatings;Vacuum;2024-06

2. Synergistic Effect of He for the Fabrication of Ne and Ar Gas-Charged Silicon Thin Films as Solid Targets for Spectroscopic Studies;Nanomaterials;2024-04-21

3. The microstructure and mechanical properties of He charged Al films fabricated by HiPIMS/DCMS co-sputtering;Vacuum;2024-01

4. Mathematical Calculation of Material Reliability Using Surface Roughness Feature Based on Plasma Material Interaction Experiment Results;Eksploatacja i Niezawodność – Maintenance and Reliability;2023-07-21

5. On the Microcrystal Structure of Sputtered Cu Films Deposited on Si(100) Surfaces: Experiment and Integrated Multiscale Simulation;Molecules;2023-06-15

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