Effects of TaN, Ru, and Pt electrodes on thermal stability of hafnium-based gate stacks
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.3429238
Reference49 articles.
1. Hafnium silicide formation onSi(001)
2. Void nucleation in thin HfO2 layer on Si
3. Infrared characterization of hafnium oxide grown by atomic layer deposition using ozone as the oxygen precursor
4. Chemical and Structural Properties of a TaN/HfO[sub 2] Gate Stack Processed Using Atomic Vapor Deposition
5. Dependences of effective work functions of TaN on HfO2 and SiO2 on post-metallization anneal
Cited by 7 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Characterization of Thin Organic Films with Surface-Sensitive FTIR Spectroscopy;Ellipsometry of Functional Organic Surfaces and Films;2018
2. Characterization of Thin Organic Films with Surface-Sensitive FTIR Spectroscopy;Ellipsometry of Functional Organic Surfaces and Films;2014
3. The electrostatics of Ta2O5 in Si-based metal oxide semiconductor devices;Journal of Applied Physics;2013-02-21
4. Ab initiostudy of the electrostatic dipole modulation due to cation substitution in HfO2/SiO2interfaces;Physical Review B;2012-08-27
5. Substrate Selectivity of (tBu-Allyl)Co(CO)3 during Thermal Atomic Layer Deposition of Cobalt;Chemistry of Materials;2012-02-28
1.学者识别学者识别
2.学术分析学术分析
3.人才评估人才评估
"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370
www.globalauthorid.com
TOP
Copyright © 2019-2024 北京同舟云网络信息技术有限公司 京公网安备11010802033243号 京ICP备18003416号-3