Void nucleation in thin HfO2 layer on Si
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.1581006
Reference15 articles.
1. Thermodynamic stability of binary oxides in contact with silicon
2. Structure and stability of ultrathin zirconium oxide layers on Si(001)
3. Thermal stability of ultrathin ZrO2 films prepared by chemical vapor deposition on Si(100)
4. Thermal decomposition of ZrO2/SiO2 bilayer on Si(001) caused by void nucleation and its lateral growth
5. Reaction steps of silicidation in ZrO2/SiO2/Si layered structure
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