Substrate Selectivity of (tBu-Allyl)Co(CO)3 during Thermal Atomic Layer Deposition of Cobalt-Reference-Cited by-同舟云学术

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Substrate Selectivity of (tBu-Allyl)Co(CO)3 during Thermal Atomic Layer Deposition of Cobalt

Published:2012-02-28 Issue:6 Volume:24 Page:1025-1030
ISSN:0897-4756
Container-title:Chemistry of Materials
language:en
Short-container-title:Chem. Mater.

Author:

Kwon Jinhee¹,Saly Mark²,Halls Mathew D.³,Kanjolia Ravindra K.²,Chabal Yves J.¹

Affiliation:

1. Department of Materials Science and Engineering, The University of Texas at Dallas, Richardson, Texas 75080, United States

2. SAFC Hitech, Haverhill, Massachusetts 01832, United States

3. Materials Design Inc., San Diego, California 92127, United States

Publisher

American Chemical Society (ACS)

Subject

Materials Chemistry,General Chemical Engineering,General Chemistry

Link

https://pubs.acs.org/doi/pdf/10.1021/cm2029189

Reference29 articles.

1. Giant magnetoresistance in semiconductor/granular film heterostructures with cobalt nanoparticles

2. Nanoconstriction microscopy of the giant magnetoresistance in cobalt/copper spin valves

3. Cobalt-dopedβ-peptide nanotubes: A class of spintronic materials

4. Ultrathin epitaxial cobalt films on graphene for spintronic investigations and applications

5. Plasma Assisted Dry Etching of Cobalt Silicide for Microelectronics Applications

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1. Nucleation Delay in Selective Atomic Layer Deposition: Density Functional Insights Coupled Numerical Nucleation Model;The Journal of Physical Chemistry C;2024-06-07

2. Atomic layer deposition of magnetic thin films: Basic processes, engineering efforts, and road forward;Applied Physics Reviews;2023-12-01

3. Low Temperature Area Selective Atomic Layer Deposition of Ruthenium Dioxide Thin Films Using Polymers as Inhibition Layers;Advanced Materials Interfaces;2023-02-15

4. Syntheses of η ¹ ‐Alkyl‐ η ³ ‐Allyl‐ η ⁵ ‐Cyclopentadienyl Cobalt(III) Complexes and Their Use in Low‐temperature Atomic Layer Deposition of Cobalt‐Containing Thin Films;Chemistry – A European Journal;2023-02-14

5. Density functional theory study on the selective capping of cobalt on copper interconnect;Applied Surface Science;2022-05

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