A method for measuring barrier heights, metal work functions and fixed charge densities in metal/SiO2/Si capacitors
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.1489098
Reference6 articles.
1. Metal gates for advanced CMOS technology
2. Interface formation and thermal stability of advanced metal gate and ultrathin gate dielectric layers
3. Volt-current characteristics for tunneling through insulating films
4. Electron energy barriers between (100)Si and ultrathin stacks of SiO2, Al2O3, and ZrO2 insulators
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