Metal gates for advanced CMOS technology-Reference-Cited by-同舟云学术

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Metal gates for advanced CMOS technology

Published:1999-09-01 Issue: Volume: Page:
ISSN:0277-786X
Container-title:SPIE Proceedings
language:
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Author:

Maiti Bikas,Tobin Phil J.

Publisher

SPIE

Cited by 13 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Study of digital/analog performance parameters of misaligned gate recessed double gate junctionless field-effect-transistor for circuit level application;Semiconductor Science and Technology;2022-03-10

2. The Work Function Behavior of Aluminum-Doped Titanium Carbide Grown by Atomic Layer Deposition;IEEE Transactions on Electron Devices;2016-04

3. Thoughts on Possible Future Charge-Based Technologies for Nano-Electronics;IEEE Transactions on Circuits and Systems I: Regular Papers;2014-11

4. Detection of photo resist residue on advanced gate layers using optical scattering and advanced analysis techniques;SPIE Proceedings;2010-03-11

5. Decoupling the Fermi-level pinning effect and intrinsic limitations on p-type effective work function metal electrodes;Microelectronic Engineering;2008-01

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