Shallow Si donor in ion-implanted homoepitaxial AlN
Author:
Affiliation:
1. Department of Material Science and Engineering, North Carolina State University, Raleigh, North Carolina 27695, USA
2. Adroit Materials, 2054 Kildaire Farm Road, Cary, North Carolina 27518, USA
Funder
National Science Foundation
Air Force Office of Scientific Research
Army Research Office
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/am-pdf/10.1063/1.5144080
Reference40 articles.
1. Determination of the Al mole fraction and the band gap bowing of epitaxial AlxGa1−xN films
2. Temperature Dependence of Band Gap Change in InN and AlN
3. Fabrication of vertical Schottky barrier diodes on n-type freestanding AlN substrates grown by hydride vapor phase epitaxy
4. Schottky contact formation on polar and non-polar AlN
5. Ni/Au Schottky diodes on AlxGa1-xN (0.7
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